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毕秀文,梁海莲,顾晓峰,黄龙(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering,Jiangnan University).Design of novel DDSCR with embedded PNP structure for ESD protection[J].半导体学报(英文版),2015,第12期
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陈弘达1,张赞1,黄北举1,毛陆虹2,张赞允3(State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences;Department of Electronics and Information Engineering, Tianjin University;School of Electronics and Information Engineering, Tianjin Polytechnic University).Progress in complementary metal–oxide–semiconductor silicon photonics and optoelectronic integrated circuits[J].半导体学报(英文版),2015,第12期
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刘珂,杜占坤,邵莉,马骁(Institute of Microelectronics, Chinese Academy of Sciences).A trimming technique for capacitive SAR ADC as sensor interface[J].半导体学报(英文版),2015,第12期
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Cholho Jang1,2,叶志镇1,吕建国1(State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University;Department of Materials Science, Kim Il Sung University).Highly transparent low resistance Ga doped ZnO/Cu grid double layers prepared at room temperature[J].半导体学报(英文版),2015,第12期
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黄杨1,徐跃1,2,郭宇锋1,2(College of Electronic Science & Engineering, Nanjing University of Posts and Telecommunications;Jiangsu Provincial Engineering Laboratory of RF Integration & Micro-Packaging).Performance prediction of four-contact vertical Hall-devices using a conformal mapping technique[J].半导体学报(英文版),2015,第12期
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Liu Chen,Zhang Yuming,Zhang Yimen,Lü Hongliang,Lu Bin(School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University).Temperature dependent interfacial and electrical characteristics during atomic layer deposition and annealing of HfO2 films in p-GaAs metal–oxide–semiconductor capacitors[J].半导体学报(英文版),2015,第12期
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岳情情,闫金良,孟德兰(School of Physics and Optoelectronic Engineering, Ludong University).Transparent and conductive PEDOT:PSS/Ag NW/PEDOT:PSS hybrid films prepared by spin-coating at room temperature[J].半导体学报(英文版),2015,第12期
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K.Mahmood1,N.Amin1,A.Ali1,M.Ajaz un Nabi1,M.Imran Arshad1,M.Zafar2,M.Asghar2(Department of Physics, GC University Faisalabad;Department of Physics, Islamia University of Bahawalpur).Enhancement of phosphors-solubility in ZnO by thermal annealing[J].半导体学报(英文版),2015,第12期
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韩超1,张玉明1,宋庆文1,2,汤晓燕1,郭辉1,张义门1,杨霏3,钮应喜3(School of Microelectronics, Xidian University, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices;School of Advanced Materials and Nanotechnology, Xidian University;State Grid Smart Grid Research Institute).Interface annealing characterization of Ti/Al/Au ohmic contacts to p-type 4H-SiC[J].半导体学报(英文版),2015,第12期
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刘剑,黄仕华,何绿(Physics Department, Zhejiang Normal University).Metal-catalyzed growth of In2O3 nanotowers using thermal evaporation and oxidation method[J].半导体学报(英文版),2015,第12期
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洪姣1,2,刘玉岭1,2,张保国1,2,牛新环1,2,韩力英1(School of Electronic Information Engineering, Hebei University of Technology;Tianjin Key Laboratory of Electronic Materials and Devices).A new kind of chelating agent with low pH value applied in the TSV CMP slurry[J].半导体学报(英文版),2015,第12期
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付英春,王晓峰,马刘红,周亚玲,杨香,王晓东,杨富华(Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences).High quality metal-quantum dot-metal structure fabricated with a highly compatible self-aligned process[J].半导体学报(英文版),2015,第12期
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贾少华,刘玉岭,王辰伟,闫辰奇(Institute of Microelectronics, Hebei University of Technology).Influence of oxidant passivation on controlling dishing in alkaline chemical mechanical planarization[J].半导体学报(英文版),2015,第12期
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Jiji Koshy,Soosen Samuel.M,Anoop Chandran,K.C.George(Department of Physics, S.B.College).Correlated barrier hopping of CuO nanoparticles[J].半导体学报(英文版),2015,第12期
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Anna V.Krivosheeva1,Victor L.Shaposhnikov1,Victor E.Borisenko1,Jean-Louis Lazzari2,Chow Waileong3,4,Julia Gusakova1,3,Beng Kang Tay3,4(Belarusian State University of Informatics and Radioelectronics;CNRS, Aix-Marseille Université;NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University;CINTRA CNRS,NTU,THALES, Nanyang Technological University).Theoretical study of defect impact on two-dimensional MoS2[J].半导体学报(英文版),2015,第12期
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夏兴衡1,吴为敬1,宋小峰1,李冠明1,周雷2,张立荣2,徐苗1,王磊1,彭俊彪1(State Key Laboratory of Luminescent Materials and Devices, South China University of Technology;New Vision Opto-Electronic Technology Co., Ltd.).High-speed low-power voltage-programmed driving scheme for AMOLED displays[J].半导体学报(英文版),2015,第12期
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秦剑1,2,姚若河1(School of Electronic and Information Engineering, South China University of Technology;Department of Electrical and Electronics Engineering, Guangzhou University).Modeling of current–voltage characteristics for dual-gate amorphous silicon thin-film transistors considering deep Gaussian density-of-state distribution[J].半导体学报(英文版),2015,第12期
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蒋梦轩1,沈征1,王俊1,帅智康1,尹新1,孙冰冰2,廖淋圆1(College of Electrical and Information Engineering, Hunan University;State Grid Bengbu Power Supply Company).An insulated gate bipolar transistor with surface n-type barrier[J].半导体学报(英文版),2015,第12期
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林俊明,章国豪,郑耀华,李思臻,张志浩,陈思弟(Guangdong University of Technology).Design of broadband class-F power amplifier with high-order harmonic suppression for S-band application[J].半导体学报(英文版),2015,第12期
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H.Bendjedidi1,A.Attaf1,H.Saidi1,M.S.Aida2,S.Semmari1,A.Bouhdjar1,Y.Benkhetta1(Laboratoire de Physique des Couches Minces et Applications, Université de Biskra;Laboratoire des Couches minces et Interfaces, Université Mentouri).Properties of n-type SnO2 semiconductor prepared by spray ultrasonic technique for photovoltaic applications[J].半导体学报(英文版),2015,第12期
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曹东华,王惠,魏红军,杨伟强(Jingao Solar Holdings Co., Ltd).Preparation, electronic structure, and photoluminescent properties of Eu2+ activated BaSi2O5 powder phosphors for solid-state lighting[J].半导体学报(英文版),2015,第12期
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Kamal Zeghdar1,Lakhdar Dehimi1,2,Achour Saadoune1,Nouredine Sengouga1(Laboratory of Metallic and Semi-conducting Materials (LMSM), Université de Biskra;Faculty of Science, Université de Batna).Inhomogeneous barrier height effect on the current–voltage characteristics of an Au/n-InP Schottky diode[J].半导体学报(英文版),2015,第12期
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M Errai1,A El Kaaouachi1,H El Idrissi2(Physics Department, Ibn Zohr University, Faculty of Sciences;Laboratoire Electronique, électrotechnique, Automatique et Traitement de l’Information, Département Génie Electrique,Faculté des Sciences et Techniques de Mohammedia, Université Hassan II Mohammedia Casablanca).Variable range hopping conduction in n-CdSe samples at very low temperature[J].半导体学报(英文版),2015,第12期
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戈勤,陶洪琪,余旭明(Nanjing Electronic Devices Institute).A 1.8–3 GHz-band high efficiency GaAs pHEMT power amplifier MMIC[J].半导体学报(英文版),2015,第12期
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姜柯1,2,3,陆妩1,2,郭旗1,2,何承发1,2,王信1,2,3,刘默寒1,2,3,李小龙1,2,3(Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences;Xinjiang Key Laboratory of Electronic Information Material and Device;University of Chinese Academy of Sciences).Proton radiation effect of NPN-input operational amplifier under different bias conditions[J].半导体学报(英文版),2015,第12期
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M.Yeganeh,N.Balkanian,Sh.Rahmatallahpur(West North Research Complex).Nanoscale potential barrier distributions and their effect on current transport in Ni/n type Si Schottky diode[J].半导体学报(英文版),2015,第12期
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赵雯1,郭晓强1,陈伟1,郭红霞1,林东生1,王汉宁2,罗尹虹1,丁李利1,王园明1(State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology;Beijing Microelectronics Technology Institute).Experimental study on the single event effects in pulse width modulators by laser testing[J].半导体学报(英文版),2015,第11期
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